High-Purity FC-C318 (C4F8)

About the product

Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.

FC-C318

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Merits

  • Enables high-aspect-ratio etching.
  • Boasts one of the industry’s largest production volumes and a stable supply structure supported by a strong supply chain from multiple production sites.
  • Proven sales track record with semiconductor makers.
  • High-quality technical support based on extensive marketing experience.

Characteristics

Technical Data

Appearance, odor / colorless odorless gas UN number / 1976
CAS NO/115-25-3 Liquefied gas
  • Please refer to the Product Safety Data Sheet (SDS) for the gas’s detailed properties and safety data. 

Physical & Chemical Properties of C4F8

Item Data
Physical state Gas
Appearance Liquefied gas
Color Colorless
pH Not applicable
Melting point -41 ℃
Boiling point -6 ℃ (101.3kPa)
Flash point Incombustible
Critical temperature 115.2 ℃
Vapor pressure

131kPa (0℃)

273kPa (21℃)

Critical pressure 2.77 MPa
Relative vapor density (20℃) 8.66g/L (21℃、101.3kPa)
Relative density Gas: 7.33 (air=1、101.3kPa)

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