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SDK to Start Up New C4F6 Plant in Kawasaki

Showa Denko K.K.
January 8, 2009

Showa Denko K.K. (SDK) will start up a new production facility for high-purity hexafluoro-1,3-butadiene (C4F6) gas in Kawasaki, Japan, in the first half of this year in cooperation with Air Products and Chemicals, Inc.

C4F6 is used in the process of etching thin oxide film formed on silicon wafers, to provide grooves and holes in preparation for the production of electronic circuits. Compared with existing etching gases, C4F6 ensures better processability (giving finer and deeper grooves/holes) and selectivity (affecting oxide films only). As a result, C4F6 is expected to be used increasingly in the processing of silicon wafers at line widths of less than 65 nm. Furthermore, the global warming potential (GWP) of C4F6 is less than 0.1, approximately 1/100,000 that of other fluorine-based etching gases. (GWP for CO2 is 1.)

SDK has so far been selling crude C4F6 produced in Russia after purifying it at Kawasaki site and providing quality assurance. Through the new integrated production facility at Kawasaki and the existing production site in Russia, SDK will aim to meet growing demand for C4F6 and ensure stable supply to its customers.

SDK has been expanding its operations in the area of IT chemicals, consisting mainly of high-purity gases for use in the production of semiconductors and displays. Demand for fluorine compounds, in particular, is expected to grow in the coming years for various applications, including the etching process for semiconductor production. SDK will continue to expand the lineup of fluorine compounds to further expand its IT chemicals business.

For further information, contact:
IR & PR Office (Phone: 81-3-5470-3235)