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SDK to Produce Eco-Friendly High-Purity COF2 Gas for LCD Panels

Showa Denko K.K.
January 11, 2011

 

Showa Denko K.K. (SDK) has started building a 400 t/y high-purity carbonyl fluoride (COF2) plant within the premises of its Higashinagahara Plant in Aizu-Wakamatsu City, Fukushima Prefecture, Japan, for completion in July 2011.  The gas, with lower environmental impact, is to be used in the production of liquid crystal display (LCD) panels. 

 

High-purity fluoride gases are used for etching thin oxide/nitride films formed on glass substrates in the process of LCD panel production.  The global warming potential (GWP) of COF2 is approximately 1, the level of carbon dioxide (CO2).  This value is very small compared with GWP of 23,900 for sulfur hexafluoride (SF6), a typical etching gas. 

 

With regard to disposal of used gas remaining in the process, COF2 is decomposed by hydrolysis into hydrogen fluoride (HF)—which is easy to dispose of—and CO2.  Thus, COF2 involves less disposal cost and lower environmental impact when compared with SF6 and nitrogen trifluoride (NF3), a typical cleaning gas.  (Cleaning gases are used for removing unnecessary chemical substances that stick to the inside of a chemical vapor deposition furnace after film deposition.)

 

So far, COF2 is not used much because of its purification-related technical problem and high cost.  However, SDK has lowered production cost and achieved high level of purity by fully utilizing its proprietary technologies for synthesis and purification.  Thus, SDK will be able to ensure stable supply of COF2 as an eco-friendly etching/cleaning gas. 

 

Under the new medium-term consolidated business plan PEGASUS, SDK will expand its business in high-purity gases for the production of semiconductors and displays.  The company will continue developing new eco-friendly products to expand its product lineup.


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