High-Purity FC-116 (C2F6)
About the product
Resonac’s high-purity gas used for cleaning film deposition chambers in semiconductor wafer production. Used mainly for 8-inch CVD equipment, FC-116 is also suitable for etching.
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Merits
- Boasts one of the industry’s largest production volumes and a stable supply structure supported by a strong supply chain.
- Proven sales track record with semiconductor makers.
- High-quality technical support based on extensive marketing experience.
Characteristics
Technical Data
| Appearance, odor / colorless odorless gas | UN number / 2193 |
| CAS NO／76-16-4 | Liquefied gas |
- ※ Please refer to the Product Safety Data Sheet (SDS) for the gas’s detailed properties and safety data.
Physical & Chemical Properties of C2F6
| Item | Data |
|---|---|
| Physical state | Gas |
| Appearance | Liquefied gas |
| Color | Colorless |
| Odor | Ether odor |
| pH | Not applicable |
| Melting point | -100.6 ℃ |
| Boiling point | -78.15 ℃ |
| Flash point | Incombustible |
| Autoignition point | 870 ℃ |
| Vapor pressure | 3.03 MPa (19.7 ℃) |
| Relative vapor density (20 ℃) | 4.8 (air = 1, 21.1℃) |
| Relative density | 1.109 (0℃, liquid) |
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