High-Purity FC-218 (C3F8)
About the product
Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.
Inquiry of this product
Merits
- Used for etching various types of oxide films.
- A stable supply structure supported by a strong supply chain.
- Proven sales track record with semiconductor makers.
- High-quality technical support based on extensive marketing experience.
Characteristics
Technical Data
| Appearance / colorless gas | Odor / odorless |
| CAS NO／76-19-7 | UN number / 2424 |
| High-pressure gas, liquefied gas | Incombustible |
- ※ Please refer to the Product Safety Data Sheet (SDS) for the gas’s detailed properties and safety data.
Physical & Chemical Properties of C3F8
| Item | Data |
|---|---|
| Physical state | Gas |
| Appearance | Liquefied gas |
| Color | Colorless |
| Odor | Ether odor |
| pH | Not applicable |
| Melting point | -183.0 ℃ |
| Boiling point | -36.7 ℃ |
| Flash point | Non-flammable |
| Autoignition point | Incombustible |
| Vapor pressure | 0.788 MPa (21.1 ℃) |
| Relative vapor density (20℃) | 6.5 (air = 1) |
| Relative density | 1.35 (20℃) |
Inquiry of this product