High-Purity FC-14 (CF4)

About the product

Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.

高純度ガスFC-14

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Merits

  • Applicable to various types of oxide films.
  • Boasts one of the industry’s largest production volumes and a stable supply structure supported by a strong supply chain.
  • Proven sales track record with semiconductor makers.
  • High-quality technical support based on extensive marketing experience.
  • Available in a variety of packaging modes from 47L cylinders to large containers (ISO tube trailers).

Characteristics

Technical Data

Appearance, odor / colorless odorless gas Appearance, odor / colorless odorless gas
CAS NO／75-73-0 Compressed gas
  • ※ Please refer to the Product Safety Data Sheet (SDS) for the gas’s detailed properties and safety data.

  • Physical & Chemical Properties of CF4

    Item Data
    Physical state Gas
    Appearance Liquefied gas
    Color Colorless
    pH Not applicable
    Melting point -184 ℃
    Boiling point -127.9 ℃ (101.3kPa)
    Flash point Incombustible
    Critical temperature -45.5 ℃
    Vapor pressure 3.6MPa (-45.6℃)
    Critical pressure 3743 kPa
    Relative vapor density (20℃) 3.72kg/m3 (101.3kPa, 15℃)
    Relative density 2.07 (air = 1､21℃)

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